Geoff Irvine talks high-k materials

June 6th, 2011

The successful integration of new precursor materials into a wafer fabrication process is one of the key challenges facing semi manufacturers.  Executed correctly and successfully optimized, new materials solutions are fuelling the rapid deployment of advanced technologies, which are enabling increasingly powerful and efficient end user devices.  At the forefront of this materials innovation, SAFC Hitech is applying its years of expertise to evolve current technologies, ensuring that a sustainable framework for the adoption of future technology nodes is translated from theory into reality.

In an article published at the end of February 2011 at Electro IQ, SAFC Hitech’s VP of Business Development, Dr. Geoff Irvine, talks about the introduction of high-k materials to the silicon semi space from a material supplier’s perspective, and how the development of precursors is tied to the evolution of deposition techniques and the materials used in DRAM devices.  Looking ahead, the article examines some of the challenges that face the semi industry, particularly those relating the next generation of high-k and ultra high-k materials.

Read the full article here: